electron-beam exposure

См. также в других словарях:

• electron-beam exposure — elektronpluoštis eksponavimas statusas T sritis radioelektronika atitikmenys: angl. electron beam exposure vok. Elektronenstrahlbelichtung, f rus. электронно лучевое экспонирование, n pranc. exposition par faisceau d électrons, f …   Radioelektronikos terminų žodynas

• variable-shaped electron-beam exposure installation — eksponavimo įrenginys su keičiamu elektronų pluošto pavidalu statusas T sritis radioelektronika atitikmenys: angl. variable shaped electron beam exposure installation vok. Flächenstrahlbelichtungsanlage, f rus. установка электронно лучевого… …   Radioelektronikos terminų žodynas

• Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

• Electron beam tomography — (EBT) is a specific form of computed axial tomography (CAT or CT) in which the X ray tube is not mechanically spun in order to rotate the source of X ray photons. This different design was explicitly developed to better image heart structures… …   Wikipedia

• Proximity effect (electron beam lithography) — The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider than the scanned pattern, due to the interactions of the primary beam electrons with the… …   Wikipedia

• Electron crystallography — is a method to determine the arrangement of atoms in solids using a transmission electron microscope (TEM). Contents 1 Comparison with X ray crystallography 2 Radiation damage 3 Protein structures determined by electron crystallography …   Wikipedia

• Electron — For other uses, see Electron (disambiguation). Electron Experiments with a Crookes tube first demonstrated the particle nature of electrons. In this illustration, the profile of the cross shaped target is projected against the tube face at right… …   Wikipedia

• Low-energy electron microscopy — Low energy electron microscopy, or LEEM, is a technique used by surface scientists to study surface structure at mesoscopic scale on conducting and semiconducting materials. It is based on imaging the electrons elastically scattered from the… …   Wikipedia

• Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… …   Wikipedia

• Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

• Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength …   Wikipedia